Encapsulix is a provider of a disruptive thin film deposition technology enabling ultrabarriers for next level durability in large area electronics.
The succesful rollout of new energy saving and generating devices such as OLED lighting , CIGS on flexible substrate or organic photovoltaics hinges on the availability of an industrial technology for creation of an affordable ultrabarrier, protecting the component from moisture uptake during operation, hence ensuring its durability and thus bankability.
Traditional polymer and silicone materials are falling short of delivering the required performance, and suffer from UV-induced degradation. Recent laboratory experiments have demonstrated that Atomic Layer Deposited Alumina (Al2O3) layers provide a spectacular improvement protecting electronic devices from ambient water vapor. Also secondary properties of Al2O3 , such as its hardness and large bandgap make this approach attractive. The challenge is affordability : traditional ALD systems have low throughput, and hence ultrabarriers have been dismissed as being too expensive for large scale industrial deployment.
Encapsulix now introduces the Parallel Precursor Wave (PPW) ALD equipment system. This proprietary , modular system allows to build ALD reactors having throughputs that are orders of magnitude higher than those of conventional ALD systems. The ensuing Cost of Ownership reduction makes next generation encapsulation technology economically feasible, providing an immediate path to significant gains in device durability and bankability.
Contact us at contact@encapsulix.com for more information.